Tetramethylammonium hydroxide, also known as TMAH, is a strong base commonly used in organic synthesis and semiconductor manufacturing processes. It is a quaternary ammonium compound with the formula (CH3)4NOH.
TMAH is a colorless liquid that is highly soluble in water and has a strong ammoniacal odor. It is typically used in concentrations ranging from 2-25% in water.
TMAH is often used as a developer in photolithography processes in semiconductor manufacturing to etch silicon dioxide and other materials. It is also used in organic synthesis as a base or catalyst for various reactions.
Tetramethylammonium hydroxide is corrosive and can cause severe skin and eye irritation, so proper safety precautions should be taken when handling this compound.
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